Wika Alexander Wiegand SE & Co KG, Klingenberg (Wika), is expanding its manufacturing expertise by using a Generis PECVD inline system from Singulus Technologies. This plasma technology is used for the deposition of electrical insulation and passivation layers and is used for applications in the field of sensor technology.
Producing high-quality thin films
Singulus' PECVD technology (Plasma Enhanced Chemical Vapor Deposition) enables high-quality, thin layers to be applied in an inline process. The deposition of electrically insulating and protective layers contributes to increased performance and longevity, especially in high-precision sensor components.
High degree of scalability
Singulus relies on specially developed inductively coupled linear plasma sources (ICP) for Generis PECVD. These enable a high electron and activation density with simultaneously low ion energy and very high deposition rates over large substrate widths. In particular, the combination of linear plasma source and inline process offers a high degree of scalability while maintaining exceptional layer qualities. Further advantages: wide process windows, minimal substrate damage and low CO2 footprint.