Sensitive components such as monocrystalline wafers from the photovoltaic and semiconductor industry, optical lenses and prisms as well as finely structured substrates place the highest demands on parts cleaning: The tiniest contaminations must be stably removed without damaging the surface. With the new Sonopower 3S megasonic system with frequencies of 500 and 1,000 kHz, Weber Ultrasonics has developed an efficient solution for cleaning these sensitive components. It ensures particularly gentle yet effective treatment of the components with high degrees of cleanliness.
The system consists of the intelligent Sonopower 3S Megasonic Boost and the tuned Sonoplate HF high-frequency transducers. During operation, the generator, which is available in the 250 and 500 watt power classes, uses various innovative features to ensure that cleaning is gentle on the surface while reliably removing impurities. These include combined frequency and amplitude modulation, which ensures homogeneous sound fields and prevents so-called standing waves. The Sonoscan automatically determines and sets the optimum working frequency and monitors and adjusts it during the process. This ensures that the ideal performance is always achieved even under changing operating conditions, such as temperature fluctuations, or when changing cleaning and rinsing media.