Research and development project on plasma modeling launched

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Oxford Instruments plc and Quantemol Ltd have announced a joint research and development project. The aim is to demonstrate how customized waveform bias can be used to optimize ion energy distribution for plasma processing in order to advance next-generation semiconductor manufacturing and improve system throughput.

The project is partly funded by Innovate UK, part of UK Research and Innovation, according to Oxford Instruments. Quantemol will use its Quantemol Virtual Tool software to create predictive plasma models. The models will be validated on a Plasmapro 100 Cobra ICP etching system in Oxford Instruments' development laboratory to create robust and predictable plasma process simulations.

The simulations will be used to optimize plasma processes for higher speed and efficiency. The customized waveform bias, in turn, is designed to minimize damage to materials and device structures on the semiconductor wafer. The goal is to enable faster and more resource-efficient development of plasma processes for semiconductor manufacturing and to improve device performance.

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