How industrial plasma processes can be specifically stabilized and optimized with the help of modern plasma diagnostics was the focus of an international workshop held by the European Research Association for Thin Films (EFDS). The event, entitled "Stable Control and Efficient Design of Industrial Plasma Processes with Plasma Diagnostics," brought together around 50 experts from industry and science in Dresden on December 2 and 3.
Plasma diagnostics as the key to process reliability
Plasma-assisted coating and surface processes are characterized by complex interactions. Continuous monitoring of key parameters is necessary to achieve reproducible layer properties and high process efficiency. The workshop covered established measurement variables such as gas pressure, gas flow, and target voltage, as well as advanced spectroscopic methods and probe diagnostics for process development.
Focus on reactive magnetron sputtering
One focus was on the control of reactive magnetron sputtering processes. Technical presentations showed how highly dynamic control loops and suitable sensor signals help to operate processes stably in the transition range and avoid target poisoning. Practical examples illustrated the influence of plasma emission, target voltage, and gas flow on deposition rate and layer properties.
Sensors, digital twins, and AI
Current developments range from multifunctional real-time sensors to digital twins that combine physical models with process data and AI methods. These approaches enable more precise prediction of layer thickness, composition, and material properties, helping to reduce scrap and narrow process windows.
Platform for exchange and networking
The workshop offered participants a comprehensive overview of available diagnostic techniques and new trends in plasma process monitoring. The conference was organized by the EFDS in collaboration with Ruhr University Bochum, Christian Albrecht University of Kiel, Fraunhofer FEP, and PLASUS GmbH.