The inline cathode sputtering systems - for example the Vistaris PVD with vertical substrate transport and the Generis PVD series with horizontal substrate transport - enable the precise and accurate deposition of high-purity, specialized coating systems on metallic and composite substrates. These coatings optimize the electrical and chemical properties of the bipolar plates and ensure high efficiency and long-term stability in hydrogen applications, according to the machine manufacturer. The Generis PVD is available in three sizes: 750 S, 1250 M and 1800 L. The coating area is approximately 510 x 1500 mm², 850 x 1000 mm² and 1400 x 1600 mm² respectively. Both system types are inline coating systems and therefore offer efficiency advantages compared to batch systems.
According to the manufacturer, typical features include the parallel processing of several substrates, and different substrate sizes are also possible. The machines have a modular design and manual or semi-automatic laboratory versions are available on request. The systems also feature substrate heating before and during the coating process for efficient substrate pre-treatment. Sputtering on both sides is also possible, as is flexible adjustment of the sputtering sequence. Rotatable cylindrical magnetrons are included to maximize material utilization, as well as a special precious metal recovery system with a complete recycling chain.