ALD System Deposits Molybdenum

Anzeige Vacuum Technology | Created by SI

The U.S. manufacturer Applied Materials Inc., Santa Clara, has introduced the Applied Centris Spectral Molybdenum ALD system. It selectively deposits monocrystalline molybdenum and reduces the critical contact resistance when connecting transistors by up to 15 percent compared with the Applied Endura Volta Selective Tungsten system.

Because these contacts form the smallest connections between interconnects and transistors, maintaining low resistance is crucial to ensuring maximum chip performance and energy efficiency.

Spectral represents a new series of ALD tools featuring a quad-reactor design with precise chemical delivery, a range of plasma and thermal processing capabilities, and hardware for both temporal and spatial ALD operation. This configuration enables the production of a wide variety of layers for AI chips. The Spectral system is used by manufacturers of logic chips with process nodes of 2 nm and below.

According to Applied Materials, enabling more powerful AI requires innovations that extend beyond transistors. As scaling moves below 2 nm, the metal contacts that connect each transistor to the wiring network become increasingly thinner. This contributes to the chip’s overall resistance and creates a bottleneck for performance and energy efficiency. At these nanoscale dimensions, conventional tungsten contacts are reaching their limits. Molybdenum — a metal that can be made thinner without impairing electron flow — has emerged as an alternative for next-generation contacts at angstrom-class nodes.

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